By Doi, Toshiro; Marinescu, Ioan D.; Kurokawa, Syuhei(eds.)
CMP and sprucing are the main distinct approaches used to complete the surfaces of mechanical and digital or semiconductor elements. This e-book offers the newest advancements and technological strategies within the box, making state of the art R&D obtainable to the broader engineering group. lots of the functions of those approaches are saved as private as attainable (proprietary information), and particular information are usually not visible in expert or technical journals and magazines. This e-book makes those methods and purposes obtainable to a much broader commercial and educational viewers. construction at the basics of tribology, the technology of friction, put on and lubrication, the authors discover the sensible purposes of CMP and sharpening throughout a number of industry sectors. as a result excessive speed of improvement of the electronics and semiconductors undefined, a few of the awarded tactics and purposes come from those industries.
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Extra info for Advances in CMP/Polishing Technologies for the Manufacture of Electronic Devices
Blocky shaped. • Extremely rough surface (more cutting points). • Surface area 300% greater than monocrystalline diamond. (2) Cubic Boron Nitride (CBN) Cubic boron nitride is commonly known as BorazonTM CBN, and is a man-made synthetic abrasive. CBN is made from cubic boron nitride grains bonded by ceramic material. It is as hard as diamond on the Mohs scale, making it well suited for ferrous materials in lapping operations, as it will not carbonize when interacting with iron (Fe), as diamond abrasives may.
The cutting rate is uniform and repeatable. No dulling of the abrasive takes place, as in the case of a single point turning tool or milling cutter, because fresh sharp abrasive particles are gradually fed to the lapping area during the processing cycle. 10. The operating costs are low because of less handling, higher efficiency, greater repeatability and the feasibility of combining machining operations. 6 Parameters of Double-Sided Lapping The following process parameters are important for the double-sided lapping process: 54 Advances in CMP/Polishing Technologies • Variable pressure during lapping cycle.
Firstly, the total thickness variation (TTV) and profile bending rate, defined as warp, are extremely important in wafer slicing. 10. The dielectric fluid normally used in HS-WEDM is a mixture of water, emulsifier and oil. These produce debris, gas, heat and oil in the spark gap, which can be degraded and react to form a colloidal substance, which is adhesive and aggregates in the gap. When this occurs, the debris evacuation capacity is decreased, and fresh dielectric fluid cannot reach the gap, which seriously influences the machining rate, surface quality and wire breaking.